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Journal Article 2

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2024 1

2017 1

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Coexistence of light emission and photodetection 1

Density functional theory 1

Electrodeposition 1

Homogeneous integration 1

Interconnect 1

Microstructure 1

Molybdenum 1

Molybdenum–cobalt 1

Multiple-quantum-well diode 1

Visible light interconnection 1

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Electrical Resistivity Modification of Electrodeposited Mo and Mo–Co Nanowires for Interconnect Applications Article

Jun Hwan Moon, Taesoon Kim, Youngmin Lee, Seunghyun Kim, Yanghee Kim, Jae-Pyoung Ahn, Jungwoo Choi, Hyuck Mo Lee, Young Keun Kim

Engineering 2024, Volume 32, Issue 1, Pages 128-138 doi: 10.1016/j.eng.2023.07.017

Abstract: To overcome this limitation, the exploration and development of novel interconnect materials and processesMolybdenum (Mo) is attracting attention as an advanced interconnect material due to its small resistivity

Keywords： Molybdenum Molybdenum–cobalt Interconnect Microstructure Electrodeposition Density functional theory

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On-chip optical interconnect using visible light Article

Wei CAI, Bing-cheng ZHU, Xu-min GAO, Yong-chao YANG, Jia-lei YUAN, Gui-xia ZHU, Yong-jin WANG, Peter GRÜNBERG

Frontiers of Information Technology & Electronic Engineering 2017, Volume 18, Issue 9, Pages 1288-1294 doi: 10.1631/FITEE.1601720

Abstract: We propose and fabricate a monolithic optical interconnect ona GaN-on-silicon platform using a wafer-levelMonolithic optical interconnect chip integrates the emitter,waveguide, base, and collector into a multi-componentThe proposedmonolithic optical interconnect opens a promising way toward the diverseapplications from

Keywords： Homogeneous integration Multiple-quantum-well diode Visible light interconnection Coexistence of light emission and photodetection